{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11480880","patent":{"patent_number":"US-11480880","title":"Treatment liquid, method of manufacturing treatment liquid, pattern forming method, and method of manufacturing electronic device","assignee":null,"inventors":[],"filing_date":"2018-10-03T00:00:00.000Z","publication_date":"2022-10-25T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":29,"abstract":"An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor with which the occurrence of defects is suppressed such that a fine resist pattern or a fine semiconductor element can be manufactured.A treatment liquid for manufacturing a semiconductor according to an embodiment of the present invention includes: one compound (A) or two or more compounds (A) that satisfy the following requirement (a); one compound (B) or two or more compounds (B) that satisfy the following requirement (b); and one compound (C) or two or more compounds (C) selected from the group consisting of an Al compound and an NOx compound. In the treatment liquid, a total content of the compound (A) in the treatment liquid is 70.0 to 99.9999999 mass %, a total content of the compounds (B) is 10−10 to 0.1 mass %, and a ratio P of the compound (C) to the compound (B) represented by the following Expression I is 103 to 10−6. Requirement (a): a compound that is selected from the group consisting of an amide compound, an imide compound, and a sulfoxide compound and of which a content in the treatment liquid is 5.0 to 99.9999999 mass %Requirement (b): a compound that is selected from the group consisting of an amide compound having 6 or more carbon atoms, an imide compound, and a sulfoxide compound and of which a content in the treatment liquid is 10−1 to 0.1 mass % P=[Total Mass of Compound (C)]/[Total Mass of Compound (B)]  (Expression I)"},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Treatment liquid, method of manufacturing treatment liquid, pattern forming method, and method of manufacturing electronic device","description":"An object of the present invention is to provide a treatment liquid for manufacturing a semiconductor with which the occurrence of defects is suppressed such that a fine resist pattern or a fine semic","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11480880","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11480880","citation_suggestion":"Patentable. \"Treatment liquid, method of manufacturing treatment liquid, pattern forming method, and method of manufacturing electronic device\" (US-11480880). https://patentable.app/patents/US-11480880","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11480880","json":"https://patentable.app/api/llm-context/US-11480880","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T01:31:25.962Z"}