{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11493909","patent":{"patent_number":"US-11493909","title":"Method for detecting environmental parameter in semiconductor fabrication facility","assignee":null,"inventors":[],"filing_date":"2021-04-16T00:00:00.000Z","publication_date":"2022-11-08T00:00:00.000Z","cpc_codes":["G05B","H01L","G01N","H01L","H01L","H01L","H01L","H01L","G05B","G05B"],"num_claims":20,"abstract":"A semiconductor fabrication facility (FAB) is provided. The FAB includes a number of processing tools. The FAB also includes a sampling station connected to the processing tools. In addition, the FAB includes a detection vehicle detachably connected to the sampling station and comprising a metrology module. When the detection vehicle is connected to the sampling station, a gas sample is delivered from one of the processing tools to the metrology module of the detection vehicle via the sampling station for performing a measurement of a parameter in related to the gas sample by the metrology module. In addition, the FAB includes a control system configured to issue a warning when the parameter in related to the gas sample from the one of the processing tools is out of a range of acceptable values associated with the one of the processing tools."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for detecting environmental parameter in semiconductor fabrication facility","description":"A semiconductor fabrication facility (FAB) is provided. The FAB includes a number of processing tools. The FAB also includes a sampling station connected to the processing tools. In addition, the FAB ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11493909","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11493909","citation_suggestion":"Patentable. \"Method for detecting environmental parameter in semiconductor fabrication facility\" (US-11493909). https://patentable.app/patents/US-11493909","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11493909","json":"https://patentable.app/api/llm-context/US-11493909","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:25:32.377Z"}