{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11502163","patent":{"patent_number":"US-11502163","title":"Semiconductor structure and fabrication method thereof","assignee":null,"inventors":[],"filing_date":"2019-10-23T00:00:00.000Z","publication_date":"2022-11-15T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":10,"abstract":"A semiconductor structure includes an active region, an isolation structure, a first gate structure, and a second gate structure. The active region is disposed over a semiconductor substrate and has a first portion, a second portion, and a third portion. The third portion is between the first portion and the second portion. A shape of the first portion is different from a shape of the third portion, in a top view. The isolation structure is disposed over the semiconductor substrate and surrounds the active region. The first gate structure is disposed between the first portion and the third portion of the active region. The second gate structure is disposed between the second portion and the third portion of the active region."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor structure and fabrication method thereof","description":"A semiconductor structure includes an active region, an isolation structure, a first gate structure, and a second gate structure. The active region is disposed over a semiconductor substrate and has a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11502163","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11502163","citation_suggestion":"Patentable. \"Semiconductor structure and fabrication method thereof\" (US-11502163). https://patentable.app/patents/US-11502163","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11502163","json":"https://patentable.app/api/llm-context/US-11502163","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T07:17:11.635Z"}