{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11505456","patent":{"patent_number":"US-11505456","title":"Method for producing hollow structure and hollow structure","assignee":null,"inventors":[],"filing_date":"2019-12-20T00:00:00.000Z","publication_date":"2022-11-22T00:00:00.000Z","cpc_codes":["A61B","H01L","H04R","H04R","H04R"],"num_claims":12,"abstract":"A method includes a step of forming a sacrificial layer on a first film, a step of forming a second film on the sacrificial layer, a step of forming an etching opening that extends through at least one of the first film and the second film so as to communicate with the sacrificial layer, and a step of forming a hollow portion by etching the sacrificial layer using a gas containing a fluorine-containing gas and hydrogen via the etching opening, wherein a composition ratio of silicon to nitrogen in a first region having a face in contact with the sacrificial layer is larger than a composition ratio of silicon to nitrogen in a second region not including the first region."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for producing hollow structure and hollow structure","description":"A method includes a step of forming a sacrificial layer on a first film, a step of forming a second film on the sacrificial layer, a step of forming an etching opening that extends through at least on","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11505456","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11505456","citation_suggestion":"Patentable. \"Method for producing hollow structure and hollow structure\" (US-11505456). https://patentable.app/patents/US-11505456","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11505456","json":"https://patentable.app/api/llm-context/US-11505456","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:57:46.025Z"}