{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11506290","patent":{"patent_number":"US-11506290","title":"Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method","assignee":null,"inventors":[],"filing_date":"2018-09-11T00:00:00.000Z","publication_date":"2022-11-22T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":4,"abstract":"A valve device is capable of precisely adjusting a flow rate variation due to aging, aging, etc. without using an external sensor. An adjusting actuator includes a piezoelectric element for adjusting the position of the operating member positioned at the open position, and the drive circuit of the adjusting actuator includes a detecting unit for detecting an electric signal related to the amount of strain generated in the piezoelectric element, and a control unit for controlling the adjusting actuator so that the opening degree of the flow path by the valve element becomes the target opening degree based on the electric signal related to the amount of strain of the piezoelectric element."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method","description":"A valve device is capable of precisely adjusting a flow rate variation due to aging, aging, etc. without using an external sensor. An adjusting actuator includes a piezoelectric element for adjusting ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11506290","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11506290","citation_suggestion":"Patentable. \"Valve apparatus, flow rate adjusting method, fluid control apparatus, flow rate control method, semiconductor manufacturing apparatus, and semiconductor manufacturing method\" (US-11506290). https://patentable.app/patents/US-11506290","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11506290","json":"https://patentable.app/api/llm-context/US-11506290","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T22:37:22.070Z"}