{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11513083","patent":{"patent_number":"US-11513083","title":"Photolithography method and photolithography system","assignee":null,"inventors":[],"filing_date":"2021-08-06T00:00:00.000Z","publication_date":"2022-11-29T00:00:00.000Z","cpc_codes":["G01N","G01N","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"A photolithography method includes dispensing a first liquid onto a first target layer formed over a first wafer through a nozzle at a first distance from the first target layer; capturing an image of the first liquid on the first target layer; patterning the first target layer after capturing the image of the first liquid; comparing the captured image of the first liquid to a first reference image to generate a first comparison result; responsive to the first comparison result, positioning the nozzle and a second wafer such that the nozzle is at a second distance from a second target layer on the second wafer; dispensing a second liquid onto the second target layer formed over the second wafer through the nozzle at the second distance from the second target layer; and patterning the second target layer after dispensing the second liquid."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Photolithography method and photolithography system","description":"A photolithography method includes dispensing a first liquid onto a first target layer formed over a first wafer through a nozzle at a first distance from the first target layer; capturing an image of","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11513083","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11513083","citation_suggestion":"Patentable. \"Photolithography method and photolithography system\" (US-11513083). https://patentable.app/patents/US-11513083","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11513083","json":"https://patentable.app/api/llm-context/US-11513083","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:44:31.097Z"}