{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11513442","patent":{"patent_number":"US-11513442","title":"Method of determining control parameters of a device manufacturing process","assignee":null,"inventors":[],"filing_date":"2018-08-22T00:00:00.000Z","publication_date":"2022-11-29T00:00:00.000Z","cpc_codes":["G06F","G06T","H01L","G06F","G06F","G06F","H01L"],"num_claims":20,"abstract":"A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least part of the substrate, wherein the image includes at least the feature; determining a contour of the feature from the image; determining a plurality of segments of the contour; determining respective weights for each of the plurality of segments; determining, for each of the segments, an image-related metric; and determining the metric of the feature in dependence on the weights and the calculated image-related metric of each of the segments."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of determining control parameters of a device manufacturing process","description":"A method for determining a metric of a feature on a substrate obtained by a semiconductor manufacturing process involving a lithographic process, the method including: obtaining an image of at least p","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11513442","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11513442","citation_suggestion":"Patentable. \"Method of determining control parameters of a device manufacturing process\" (US-11513442). https://patentable.app/patents/US-11513442","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11513442","json":"https://patentable.app/api/llm-context/US-11513442","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:21:13.197Z"}