{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11521848","patent":{"patent_number":"US-11521848","title":"Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium","assignee":null,"inventors":[],"filing_date":"2021-09-20T00:00:00.000Z","publication_date":"2022-12-06T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":17,"abstract":"There is provided technique that includes (a) adsorbing a first adsorption inhibitor to a first portion of a substrate in a first process chamber by heating the substrate to a first temperature and supplying the first adsorption inhibitor; (b) after (a), forming a film on a second portion of the substrate, where the first adsorption inhibitor is not adsorbed, by heating the substrate to a second temperature higher than the first temperature and supplying a processing gas; and (c) after (b), removing the first adsorption inhibitor adsorbed to the substrate by heating the substrate to a third temperature higher than the second temperature."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium","description":"There is provided technique that includes (a) adsorbing a first adsorption inhibitor to a first portion of a substrate in a first process chamber by heating the substrate to a first temperature and su","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11521848","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11521848","citation_suggestion":"Patentable. \"Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium\" (US-11521848). https://patentable.app/patents/US-11521848","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11521848","json":"https://patentable.app/api/llm-context/US-11521848","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:35:40.597Z"}