{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11521874","patent":{"patent_number":"US-11521874","title":"Systems and methods for determining measurement location in semiconductor wafer metrology","assignee":null,"inventors":[],"filing_date":"2021-01-13T00:00:00.000Z","publication_date":"2022-12-06T00:00:00.000Z","cpc_codes":["H01L","G06T","G06T","G06T"],"num_claims":25,"abstract":"A system and method for generating a quality metric relating to a fully or partially fabricated semiconductor device wafer (FPFSDW), the method including providing a spot map correlating a plurality of reference field images (RFIs) to a corresponding plurality of reference spot locations (RSLs) on at least one reference structure formed on a reference semiconductor device wafer, taking a measurement of at least a portion of at least one FPFSDW structure formed on the FPFSDW, thereby generating a measurement field image (MFI) of at least a portion of the at least one FPFSDW structure and a pupil image of the at least a portion of the at least one FPFSDW structure, identifying, for the measurement, a measurement spot location (MSL) on the at least one FPFSDW structure, using the MFI and the spot map, and generating a quality metric of the FPFSDW, using the pupil image and the MSL."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Systems and methods for determining measurement location in semiconductor wafer metrology","description":"A system and method for generating a quality metric relating to a fully or partially fabricated semiconductor device wafer (FPFSDW), the method including providing a spot map correlating a plurality o","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11521874","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11521874","citation_suggestion":"Patentable. \"Systems and methods for determining measurement location in semiconductor wafer metrology\" (US-11521874). https://patentable.app/patents/US-11521874","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11521874","json":"https://patentable.app/api/llm-context/US-11521874","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:24:52.520Z"}