{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11523649","patent":{"patent_number":"US-11523649","title":"Garment pattern optimization system and method","assignee":null,"inventors":[],"filing_date":"2018-12-06T00:00:00.000Z","publication_date":"2022-12-13T00:00:00.000Z","cpc_codes":["G05B","G05B"],"num_claims":12,"abstract":"According to an embodiment, the invention relates to a computer implemented method for grading a pattern from a first size to a second size, the pattern comprising one or more panels, the method comprising the steps of a representation step comprising representing each panel of the one or more panels by a contour, wherein a contour comprises one or more segments, a constraint step comprising imposing constraints on segments for grading to the second size; generating a mesh of each panel of the one or more panels thereby obtaining a first set of meshes; combining the first set of meshes with the constraints into a system of equations; solving the system of equations into a second set of meshes, wherein the contours of the second meshes correspond to the pattern in the second size and representing the contours of the second set of meshes."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Garment pattern optimization system and method","description":"According to an embodiment, the invention relates to a computer implemented method for grading a pattern from a first size to a second size, the pattern comprising one or more panels, the method compr","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11523649","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11523649","citation_suggestion":"Patentable. \"Garment pattern optimization system and method\" (US-11523649). https://patentable.app/patents/US-11523649","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11523649","json":"https://patentable.app/api/llm-context/US-11523649","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:13:45.965Z"}