{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11526085","patent":{"patent_number":"US-11526085","title":"Metrology method and apparatus, substrate, lithographic system and device manufacturing method","assignee":null,"inventors":[],"filing_date":"2020-08-10T00:00:00.000Z","publication_date":"2022-12-13T00:00:00.000Z","cpc_codes":["G01N"],"num_claims":20,"abstract":"In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Metrology method and apparatus, substrate, lithographic system and device manufacturing method","description":"In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11526085","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11526085","citation_suggestion":"Patentable. \"Metrology method and apparatus, substrate, lithographic system and device manufacturing method\" (US-11526085). https://patentable.app/patents/US-11526085","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11526085","json":"https://patentable.app/api/llm-context/US-11526085","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T23:05:27.418Z"}