{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11526827","patent":{"patent_number":"US-11526827","title":"Non-intrusive workflow assessment (NIWA) for manufacturing optimization","assignee":null,"inventors":[],"filing_date":"2019-09-30T00:00:00.000Z","publication_date":"2022-12-13T00:00:00.000Z","cpc_codes":["G06Q","G05B","G06Q","G06Q"],"num_claims":20,"abstract":"Non-intrusive monitoring and workflow assessment to optimize manufacturing environments are described herein. The systems and method combines computer vision and energy load disaggregation to track worker activity and equipment usage and status. These events are then correlated to optimize workflows and energy efficiency."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Non-intrusive workflow assessment (NIWA) for manufacturing optimization","description":"Non-intrusive monitoring and workflow assessment to optimize manufacturing environments are described herein. The systems and method combines computer vision and energy load disaggregation to track wo","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11526827","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11526827","citation_suggestion":"Patentable. \"Non-intrusive workflow assessment (NIWA) for manufacturing optimization\" (US-11526827). https://patentable.app/patents/US-11526827","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11526827","json":"https://patentable.app/api/llm-context/US-11526827","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T09:24:02.282Z"}