{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11935762","patent":{"patent_number":"US-11935762","title":"Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium","assignee":null,"inventors":[],"filing_date":"2022-08-16T00:00:00.000Z","publication_date":"2024-03-19T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H04W","H04W","H04W","H04W"],"num_claims":14,"abstract":"There is provided a technique that includes: a first processing module including a first process container in which at least one substrate is processed, a first utility system including a first supply system which supplies a first processing gas into the first process container and a surface of the first utility system is connected or arranged close to the first processing module; and a first vacuum pump arranged at the same level as a first exhaust port of the first process container. The first vacuum pump exhausts an inside of the first process container and includes a first intake port formed laterally at a position substantially facing the first exhaust port of the first process container. A first exhaust pipe configured to substantially linearly bring the first exhaust port into fluid communication with the first intake port and including a first valve installed in a flow path."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium","description":"There is provided a technique that includes: a first processing module including a first process container in which at least one substrate is processed, a first utility system including a first supply","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11935762","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11935762","citation_suggestion":"Patentable. \"Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium\" (US-11935762). https://patentable.app/patents/US-11935762","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11935762","json":"https://patentable.app/api/llm-context/US-11935762","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T06:57:55.943Z"}