{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11939665","patent":{"patent_number":"US-11939665","title":"Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method","assignee":null,"inventors":[],"filing_date":"2021-02-24T00:00:00.000Z","publication_date":"2024-03-26T00:00:00.000Z","cpc_codes":["G01S","G01S","H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":28,"abstract":"A film thickness measurement apparatus includes: a stage that places a substrate having a film formed thereon and measures a thickness of the film in-situ in a film forming apparatus; a film thickness meter including a light emitter that emits light toward the substrate disposed on the stage and a light receiving sensor that receives the light reflected by the substrate for measuring the thickness of the film in-situ; a moving mechanism including a multi-joint arm that moves an irradiation point of the light on the substrate; a distance meter that measures a distance between the light receiving sensor and the irradiation point on the substrate; and a distance adjustor that adjusts the distance between the light receiving sensor and the irradiation point on the substrate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method","description":"A film thickness measurement apparatus includes: a stage that places a substrate having a film formed thereon and measures a thickness of the film in-situ in a film forming apparatus; a film thickness","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11939665","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11939665","citation_suggestion":"Patentable. \"Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method\" (US-11939665). https://patentable.app/patents/US-11939665","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11939665","json":"https://patentable.app/api/llm-context/US-11939665","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T01:50:43.095Z"}