{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11942382","patent":{"patent_number":"US-11942382","title":"Semiconductor device and method for manufacturing semiconductor element","assignee":null,"inventors":[],"filing_date":"2020-05-14T00:00:00.000Z","publication_date":"2024-03-26T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":10,"abstract":"When a voltage is applied to a semiconductor element formed into a semiconductor substrate for evaluating the electrical characteristic of the semiconductor element, partial discharge between the semiconductor element and an inter-element portion, adhesion of a foreign substance to the semiconductor substrate, and formation of a trace of a component in the semiconductor substrate are prevented. A semiconductor device includes a semiconductor substrate and a discharge inhibitor. The semiconductor substrate includes a plurality of semiconductor elements and an inter-element portion. The semiconductor elements are arranged in a spreading direction of the semiconductor substrate. The inter-element portion is between adjacent semiconductor elements among the semiconductor elements. The discharge inhibitor is bonded not to a surface of a center of each semiconductor element among the semiconductor elements but to a surface of the inter-element portion. The discharge inhibitor is made of an insulator."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor device and method for manufacturing semiconductor element","description":"When a voltage is applied to a semiconductor element formed into a semiconductor substrate for evaluating the electrical characteristic of the semiconductor element, partial discharge between the semi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11942382","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11942382","citation_suggestion":"Patentable. \"Semiconductor device and method for manufacturing semiconductor element\" (US-11942382). https://patentable.app/patents/US-11942382","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11942382","json":"https://patentable.app/api/llm-context/US-11942382","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T03:57:28.275Z"}