{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11956978","patent":{"patent_number":"US-11956978","title":"Techniques and device structure based upon directional seeding and selective deposition","assignee":null,"inventors":[],"filing_date":"2020-09-03T00:00:00.000Z","publication_date":"2024-04-09T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":13,"abstract":"In one embodiment, a method of selectively forming a deposit may includeproviding a substrate, the substrate having a plurality of surface features, extending at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. The method may include directing a reactive beam to the plurality of surface features, the reactive beam defining a non-zero angle of incidence with respect to a perpendicular to the plane of the substrate, wherein a seed layer is deposited on a first portion of the surface features, and is not deposited on a second portion of the surface features. The method may further include exposing the substrate to a reactive deposition process after the directing the reactive ion beam, wherein a deposit layer selectively grows over the seed layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Techniques and device structure based upon directional seeding and selective deposition","description":"In one embodiment, a method of selectively forming a deposit may includeproviding a substrate, the substrate having a plurality of surface features, extending at a non-zero angle of inclination with r","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11956978","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11956978","citation_suggestion":"Patentable. \"Techniques and device structure based upon directional seeding and selective deposition\" (US-11956978). https://patentable.app/patents/US-11956978","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11956978","json":"https://patentable.app/api/llm-context/US-11956978","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T02:40:01.911Z"}