{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11969855","patent":{"patent_number":"US-11969855","title":"Filtering during in-situ monitoring of polishing","assignee":null,"inventors":[],"filing_date":"2023-05-17T00:00:00.000Z","publication_date":"2024-04-30T00:00:00.000Z","cpc_codes":["G05B"],"num_claims":21,"abstract":"A method of controlling polishing includes polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, filtering a signal from the monitoring system to generate a filtered signal, and determining at least one of a polishing endpoint or an adjustment for a polishing rate from the filtered signal. The filtering includes modelling a plurality of periodic disturbances at a plurality of different frequencies using a plurality of disturbance states, modelling an underlying signal using a plant state, and applying a linear prediction filter to the plant state and the plurality of disturbance states to generate a filtered signal representing the underlying signal."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Filtering during in-situ monitoring of polishing","description":"A method of controlling polishing includes polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, filtering a signal from the monitoring system to generate","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11969855","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11969855","citation_suggestion":"Patentable. \"Filtering during in-situ monitoring of polishing\" (US-11969855). https://patentable.app/patents/US-11969855","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11969855","json":"https://patentable.app/api/llm-context/US-11969855","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T00:15:12.641Z"}