{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11972194","patent":{"patent_number":"US-11972194","title":"Method for determining patterning device pattern based on manufacturability","assignee":null,"inventors":[],"filing_date":"2022-12-28T00:00:00.000Z","publication_date":"2024-04-30T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F"],"num_claims":20,"abstract":"A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for determining patterning device pattern based on manufacturability","description":"A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at leas","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11972194","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11972194","citation_suggestion":"Patentable. \"Method for determining patterning device pattern based on manufacturability\" (US-11972194). https://patentable.app/patents/US-11972194","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11972194","json":"https://patentable.app/api/llm-context/US-11972194","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:36:31.798Z"}