{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11972958","patent":{"patent_number":"US-11972958","title":"Substrate processing apparatus and substrate processing method","assignee":null,"inventors":[],"filing_date":"2021-05-12T00:00:00.000Z","publication_date":"2024-04-30T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":10,"abstract":"A substrate processing apparatus includes a processing tub configured to perform an etching processing therein by immersing multiple substrates in a processing liquid; a first and second discharge opening groups disposed under the substrates within the processing tub, and configured to discharge the processing liquid into the processing tub; a first adjusting device configured to change a flow rate of the processing liquid discharged from the first discharge opening group; a second adjusting device configured to change a flow rate of the processing liquid discharged from the second discharge opening group; a controller configured to control the first and second adjusting devices to perform, during the etching processing, a flow rate adjusting processing of increasing and decreasing the flow rate of the processing liquid discharged from the first discharge opening group and the flow rate of the processing liquid discharged from the second discharge opening group to different values."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Substrate processing apparatus and substrate processing method","description":"A substrate processing apparatus includes a processing tub configured to perform an etching processing therein by immersing multiple substrates in a processing liquid; a first and second discharge ope","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11972958","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11972958","citation_suggestion":"Patentable. \"Substrate processing apparatus and substrate processing method\" (US-11972958). https://patentable.app/patents/US-11972958","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11972958","json":"https://patentable.app/api/llm-context/US-11972958","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:38:03.910Z"}