{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11977034","patent":{"patent_number":"US-11977034","title":"Methods and apparatus for measuring a property of a substrate","assignee":null,"inventors":[],"filing_date":"2021-03-08T00:00:00.000Z","publication_date":"2024-05-07T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","G05B","H01L","G05B"],"num_claims":18,"abstract":"In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number of measurement points and is used to control an inspection apparatus to perform a plurality of measurements of the property of a plurality of substrates using different sub-sampling plans for respective substrates, optionally, the results are stacked to at least partially recompose the measurement results according to the sample plan."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods and apparatus for measuring a property of a substrate","description":"In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced defined for measuring a property of a substrate, wherein the sampling plan comp","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11977034","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11977034","citation_suggestion":"Patentable. \"Methods and apparatus for measuring a property of a substrate\" (US-11977034). https://patentable.app/patents/US-11977034","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11977034","json":"https://patentable.app/api/llm-context/US-11977034","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:48:27.803Z"}