{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11978636","patent":{"patent_number":"US-11978636","title":"Methods for processing semiconductor structures and methods for forming semiconductor structures","assignee":null,"inventors":[],"filing_date":"2021-05-24T00:00:00.000Z","publication_date":"2024-05-07T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L"],"num_claims":16,"abstract":"Embodiments of the present application provide a method for processing a semiconductor structure and a method for forming a semiconductor structure. The method for processing a semiconductor structure includes: providing a semiconductor substrate, the semiconductor substrate being provided with a feature portion, the aspect ratio of the feature portion being greater than a preset aspect ratio, a mask layer being provided on the top of the feature portion; ashing a semiconductor structure, the semiconductor structure comprising the semiconductor substrate, the feature portion, and the mask layer; cleaning the semiconductor structure; drying the semiconductor structure; and removing the mask layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for processing semiconductor structures and methods for forming semiconductor structures","description":"Embodiments of the present application provide a method for processing a semiconductor structure and a method for forming a semiconductor structure. The method for processing a semiconductor structure","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11978636","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11978636","citation_suggestion":"Patentable. \"Methods for processing semiconductor structures and methods for forming semiconductor structures\" (US-11978636). https://patentable.app/patents/US-11978636","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11978636","json":"https://patentable.app/api/llm-context/US-11978636","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T12:46:16.723Z"}