{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11980019","patent":{"patent_number":"US-11980019","title":"Semiconductor structure and forming method thereof","assignee":null,"inventors":[],"filing_date":"2021-04-12T00:00:00.000Z","publication_date":"2024-05-07T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":10,"abstract":"The present disclosure relates to the technical field of semiconductor manufacturing, and provides a semiconductor structure and a forming method thereof. The forming method includes: providing a semiconductor substrate, where a surface of the semiconductor substrate is provided with a plurality of conductive structures arranged at intervals; etching a surface of the conductive structure into a curved surface, and then depositing sequentially to form a first protective layer, a second protective layer and a third protective layer; etching the first protective layer, the second protective layer and the third protective layer to form a contact hole exposing the etched curved surface of the conductive structure; and forming a mask layer on a surface of the contact hole."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor structure and forming method thereof","description":"The present disclosure relates to the technical field of semiconductor manufacturing, and provides a semiconductor structure and a forming method thereof. The forming method includes: providing a semi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11980019","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11980019","citation_suggestion":"Patentable. \"Semiconductor structure and forming method thereof\" (US-11980019). https://patentable.app/patents/US-11980019","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11980019","json":"https://patentable.app/api/llm-context/US-11980019","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:36:12.814Z"}