{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11984406","patent":{"patent_number":"US-11984406","title":"Semiconductor structure and method for manufacturing same","assignee":null,"inventors":[],"filing_date":"2021-07-27T00:00:00.000Z","publication_date":"2024-05-14T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":20,"abstract":"The examples of the present application disclose a semiconductor structure and a method for manufacturing the same. The semiconductor structure includes: a functional structure and a first mark structure located on a substrate, in which the functional structure and the first mark structure have the same feature size; and a first dielectric layer located at the functional structure and the first mark structure, in which a thickness of the first dielectric layer at the functional structure is different from a thickness of the first dielectric layer at the first mark structure. The examples of the present application can improve the alignment accuracy of the manufacturing process and improve the product yield and production efficiency at the same time."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor structure and method for manufacturing same","description":"The examples of the present application disclose a semiconductor structure and a method for manufacturing the same. The semiconductor structure includes: a functional structure and a first mark struct","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11984406","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11984406","citation_suggestion":"Patentable. \"Semiconductor structure and method for manufacturing same\" (US-11984406). https://patentable.app/patents/US-11984406","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11984406","json":"https://patentable.app/api/llm-context/US-11984406","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:36:07.538Z"}