{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11988612","patent":{"patent_number":"US-11988612","title":"Methods for determining focus spot window and judging whether wafer needs to be reworked","assignee":null,"inventors":[],"filing_date":"2022-03-03T00:00:00.000Z","publication_date":"2024-05-21T00:00:00.000Z","cpc_codes":["G01N","G01N","H01L","H01L","H01L"],"num_claims":15,"abstract":"The present disclosure provides methods for determining a focus spot window of a wafer and judging whether the wafer needs to be reworked, belonging to the field of semiconductor technology. The method for determining a focus spot window of a wafer includes: acquiring flatness information and location information of a local region of the wafer before exposure; acquiring distribution information of abnormal dies, process information corresponding to the abnormal dies, and data information related to wafer yield; and determining the focus spot window corresponding to a process according to the flatness information and the location information of the local region of the wafer, the distribution information of the abnormal dies, the process information corresponding to the abnormal dies, and the data information related to wafer yield."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for determining focus spot window and judging whether wafer needs to be reworked","description":"The present disclosure provides methods for determining a focus spot window of a wafer and judging whether the wafer needs to be reworked, belonging to the field of semiconductor technology. The metho","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11988612","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11988612","citation_suggestion":"Patentable. \"Methods for determining focus spot window and judging whether wafer needs to be reworked\" (US-11988612). https://patentable.app/patents/US-11988612","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11988612","json":"https://patentable.app/api/llm-context/US-11988612","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T04:22:13.000Z"}