{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11988636","patent":{"patent_number":"US-11988636","title":"Method for particle analysis and method for particle production","assignee":null,"inventors":[],"filing_date":"2020-04-24T00:00:00.000Z","publication_date":"2024-05-21T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N","G01N"],"num_claims":6,"abstract":"The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment step S5 of performing an encapsulation treatment so that the first particles p1 encapsulate an encapsulation target component pt smaller than the first particles p1; a second magnetic susceptibility measurement step S8 of measuring a volume magnetic susceptibility of each of second particles p2 as an analysis target that are the first particles p1 after the encapsulation treatment; and a step S9 of analyzing whether or not the encapsulation target component pt is encapsulated in the second particles p2 based on a result of measurement in the first magnetic susceptibility measurement step S4 and a result of measurement in the second magnetic susceptibility measurement step S8. "},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for particle analysis and method for particle production","description":"The method for particle analysis includes a first magnetic susceptibility measurement step S4 of measuring a volume magnetic susceptibility of each of first particles p1; an encapsulation treatment st","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11988636","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11988636","citation_suggestion":"Patentable. \"Method for particle analysis and method for particle production\" (US-11988636). https://patentable.app/patents/US-11988636","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11988636","json":"https://patentable.app/api/llm-context/US-11988636","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T02:41:13.825Z"}