{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11992914","patent":{"patent_number":"US-11992914","title":"Polishing composition, polishing method, and method for producing substrate","assignee":null,"inventors":[],"filing_date":"2020-03-24T00:00:00.000Z","publication_date":"2024-05-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":13,"abstract":"An object of the present invention is to provide a polishing composition which can make the removal rate of a metal material and the removal rate of a resin material the same or close to each other in a chemical mechanical polishing process, which can accordingly avoid or suppress the occurrence of a step difference. The polishing composition contains: abrasive grains containing silica, with at least a part of hydrogen atoms constituting a silanol group located on a surface of the silica being substituted with a cation of at least one metal atom M selected from the group consisting of aluminum, chromium, titanium, zirconium, iron, zinc, tin, scandium, and gallium; and a dispersing medium. The pH of the polishing composition is more than 2 and 7 or less."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Polishing composition, polishing method, and method for producing substrate","description":"An object of the present invention is to provide a polishing composition which can make the removal rate of a metal material and the removal rate of a resin material the same or close to each other in","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11992914","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11992914","citation_suggestion":"Patentable. \"Polishing composition, polishing method, and method for producing substrate\" (US-11992914). https://patentable.app/patents/US-11992914","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11992914","json":"https://patentable.app/api/llm-context/US-11992914","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T05:03:15.206Z"}