{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-11996295","patent":{"patent_number":"US-11996295","title":"Pattern forming method and method for manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2021-09-01T00:00:00.000Z","publication_date":"2024-05-28T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L"],"num_claims":22,"abstract":"According to one embodiment, a pattern forming method includes: forming a first mask layer on a sample; forming a second mask layer on the first mask layer, the second mask layer containing a first inorganic material and a first organic material; forming a pattern in the second mask layer; oxidizing the first inorganic material and removing at least a portion of the first organic material from the second mask layer by exposing the second mask layer to a first oxidizing gas containing ozone; and transferring the pattern to the first mask layer by etching the first mask layer with the second mask layer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Pattern forming method and method for manufacturing semiconductor device","description":"According to one embodiment, a pattern forming method includes: forming a first mask layer on a sample; forming a second mask layer on the first mask layer, the second mask layer containing a first in","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-11996295","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-11996295","citation_suggestion":"Patentable. \"Pattern forming method and method for manufacturing semiconductor device\" (US-11996295). https://patentable.app/patents/US-11996295","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-11996295","json":"https://patentable.app/api/llm-context/US-11996295","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T02:41:52.429Z"}