{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-12001145","patent":{"patent_number":"US-12001145","title":"Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model","assignee":null,"inventors":[],"filing_date":"2019-05-17T00:00:00.000Z","publication_date":"2024-06-04T00:00:00.000Z","cpc_codes":["G06N"],"num_claims":22,"abstract":"An apparatus for analyzing an element of a photolithography process, said apparatus comprising: (a) a first measuring apparatus for recording first data of the element; and (b) means for transforming the first data into second, non-measured data, which correspond to measurement data of a measurement of the element with a second measuring apparatus; (c) wherein the means comprise a transformation model, which has been trained using a multiplicity of first data used for training purposes and second data corresponding therewith, which are linked to the second measuring apparatus."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model","description":"An apparatus for analyzing an element of a photolithography process, said apparatus comprising: (a) a first measuring apparatus for recording first data of the element; and (b) means for transforming ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-12001145","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-12001145","citation_suggestion":"Patentable. \"Apparatus and method for analyzing an element of a photolithography process with the aid of a transformation model\" (US-12001145). https://patentable.app/patents/US-12001145","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-12001145","json":"https://patentable.app/api/llm-context/US-12001145","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T19:16:54.910Z"}