{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-12002689","patent":{"patent_number":"US-12002689","title":"Semiconductor equipment regulation method and semiconductor device fabrication method","assignee":null,"inventors":[],"filing_date":"2021-11-18T00:00:00.000Z","publication_date":"2024-06-04T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":16,"abstract":"The present application relates to a semiconductor equipment regulation method, including: providing a simulated wafer; placing the simulated wafer in an etching chamber, and conditioning a temperature in the chamber by using a temperature control device while the simulated wafer is etched by using an etching gas; during the etching process, forming a polymer layer on a surface of each etch hole; acquiring a thickness distribution map of the polymer layer in the entire simulated wafer; comparing the acquired thickness distribution map with a target thickness distribution map; and adjusting a temperature control effect through using the temperature control device on each region of the simulated wafer according to a result of the comparison, so as to adjust thickness uniformity of the polymer layer in the entire wafer."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Semiconductor equipment regulation method and semiconductor device fabrication method","description":"The present application relates to a semiconductor equipment regulation method, including: providing a simulated wafer; placing the simulated wafer in an etching chamber, and conditioning a temperatur","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-12002689","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-12002689","citation_suggestion":"Patentable. \"Semiconductor equipment regulation method and semiconductor device fabrication method\" (US-12002689). https://patentable.app/patents/US-12002689","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-12002689","json":"https://patentable.app/api/llm-context/US-12002689","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T16:15:36.321Z"}