{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-12005634","patent":{"patent_number":"US-12005634","title":"Methods for photocuring liquid resin with reduced heat generation","assignee":null,"inventors":[],"filing_date":"2022-01-26T00:00:00.000Z","publication_date":"2024-06-11T00:00:00.000Z","cpc_codes":["B33Y","B33Y","B33Y","G02F"],"num_claims":3,"abstract":"In a vat polymerization printer, a beam scanner scans a light beam across a mask and into a tank containing a photo-curable resin. The mask has pixels configurable to be individually transparent or opaque to portions of the light beam, which has a diameter greater than a cross-sectional dimension of the pixels of the mask. During an exposure time duration, a first subset of the pixels are controlled to be transparent at locations corresponding to the cross section of a three-dimensional object to be printed, while a second subset of the pixels are controlled to be opaque at locations not corresponding to the cross section of the three-dimensional object. The beam scanner is controlled to scan the light beam across the mask such that the light beam is always incident on at least one of the pixels of the mask that are controlled to be transparent."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Methods for photocuring liquid resin with reduced heat generation","description":"In a vat polymerization printer, a beam scanner scans a light beam across a mask and into a tank containing a photo-curable resin. The mask has pixels configurable to be individually transparent or op","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-12005634","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-12005634","citation_suggestion":"Patentable. \"Methods for photocuring liquid resin with reduced heat generation\" (US-12005634). https://patentable.app/patents/US-12005634","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-12005634","json":"https://patentable.app/api/llm-context/US-12005634","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T00:18:39.045Z"}