{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-12009233","patent":{"patent_number":"US-12009233","title":"Imprint lithography methods comprising multiple printheads configured to generate a fluid droplet pattern with a drop exclusion zone","assignee":null,"inventors":[],"filing_date":"2021-10-26T00:00:00.000Z","publication_date":"2024-06-11T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":10,"abstract":"An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid droplet pattern includes an imprint field, wherein the imprint field has a side and a drop exclusion zone along the side, and the drop exclusion zone is narrower at a first point farther from the center of a side and wider at a second point closer to the center of the side. In another aspect, a method can be carried out using the apparatus. The apparatus and method can be useful in filling an imprint field with a formable material relatively quickly without extrusion defects or other complications."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Imprint lithography methods comprising multiple printheads configured to generate a fluid droplet pattern with a drop exclusion zone","description":"An apparatus for imprint lithography can include a logic element configured to generate a fluid droplet pattern of fluid droplets of a formable material to be dispensed onto a substrate. The fluid dro","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-12009233","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-12009233","citation_suggestion":"Patentable. \"Imprint lithography methods comprising multiple printheads configured to generate a fluid droplet pattern with a drop exclusion zone\" (US-12009233). https://patentable.app/patents/US-12009233","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-12009233","json":"https://patentable.app/api/llm-context/US-12009233","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T13:42:37.088Z"}