{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8461038","patent":{"patent_number":"US-8461038","title":"Two-track cross-connects in double-patterned metal layers using a forbidden zone","assignee":null,"inventors":[],"filing_date":"2012-03-01T00:00:00.000Z","publication_date":"2013-06-11T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L","H01L","H01L","H01L"],"num_claims":16,"abstract":"An integrated circuit is formed by forming a first interconnect pattern in parallel route tracks, and forming a second interconnect pattern in alternating parallel route tracks. The first interconnect pattern includes a first lead pattern in the parallel route tracks, and the second interconnect pattern includes a second lead pattern in an immediately adjacent route track. The first interconnect pattern includes a crossover pattern which extends from the first lead pattern to the second lead pattern. An exclusion zone in the route track immediately adjacent to the crossover pattern is free of a lead pattern for a lateral distance of two to three times the width of the crossover pattern. Metal interconnect lines are form in the first interconnect pattern and the second interconnect pattern areas, including a continuous metal crossover line through the crossover pattern area. The exclusion zone is free of the metal interconnect lines."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Two-track cross-connects in double-patterned metal layers using a forbidden zone","description":"An integrated circuit is formed by forming a first interconnect pattern in parallel route tracks, and forming a second interconnect pattern in alternating parallel route tracks. The first interconnect","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8461038","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8461038","citation_suggestion":"Patentable. \"Two-track cross-connects in double-patterned metal layers using a forbidden zone\" (US-8461038). https://patentable.app/patents/US-8461038","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8461038","json":"https://patentable.app/api/llm-context/US-8461038","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T11:17:53.099Z"}