{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8464186","patent":{"patent_number":"US-8464186","title":"Providing electron beam proximity effect correction by simulating write operations of polygonal shapes","assignee":null,"inventors":[],"filing_date":"2011-01-21T00:00:00.000Z","publication_date":"2013-06-11T00:00:00.000Z","cpc_codes":["G06F","B82Y","B82Y","H01L","H01L"],"num_claims":20,"abstract":"A method for writing a design to a material using an electron beam includes assigning a first dosage to a first polygonal shape. The first polygonal shape occupies a first virtual layer and includes a first set of pixels. The method also includes simulating a first write operation using the first polygonal shape to create the design, discerning an error in the simulated first write operation, and assigning a second dosage to a second polygonal shape to reduce the error. The second polygonal shape occupies a second virtual layer. The method further includes creating a data structure that includes the first and second polygonal shapes and saving the data structure to a non-transitory computer-readable medium."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Providing electron beam proximity effect correction by simulating write operations of polygonal shapes","description":"A method for writing a design to a material using an electron beam includes assigning a first dosage to a first polygonal shape. The first polygonal shape occupies a first virtual layer and includes a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8464186","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8464186","citation_suggestion":"Patentable. \"Providing electron beam proximity effect correction by simulating write operations of polygonal shapes\" (US-8464186). https://patentable.app/patents/US-8464186","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8464186","json":"https://patentable.app/api/llm-context/US-8464186","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T17:15:09.227Z"}