{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8466042","patent":{"patent_number":"US-8466042","title":"Method for manufacturing separated micromechanical components situated on a silicon substrate and components manufactured therefrom","assignee":null,"inventors":[],"filing_date":"2009-04-03T00:00:00.000Z","publication_date":"2013-06-18T00:00:00.000Z","cpc_codes":["H04R","H04R","H01L","H01L"],"num_claims":9,"abstract":"A method for manufacturing separated micromechanical components situated on a silicon substrate includes the following steps of a) providing separation trenches on the substrate via an anisotropic plasma deep etching method, b) irradiating the area of the silicon substrate which forms the base of the separation trenches using laser light, the silicon substrate being converted from a crystalline state into an at least partially amorphous state by the irradiation in this area, and c) inducing mechanical stresses in the substrate. In one specific embodiment, cavities are etched simultaneously with the etching of the separation trenches. The etching depths can be controlled via the RIE lag effect."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for manufacturing separated micromechanical components situated on a silicon substrate and components manufactured therefrom","description":"A method for manufacturing separated micromechanical components situated on a silicon substrate includes the following steps of a) providing separation trenches on the substrate via an anisotropic pla","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8466042","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8466042","citation_suggestion":"Patentable. \"Method for manufacturing separated micromechanical components situated on a silicon substrate and components manufactured therefrom\" (US-8466042). https://patentable.app/patents/US-8466042","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8466042","json":"https://patentable.app/api/llm-context/US-8466042","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T17:05:36.231Z"}