{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8468480","patent":{"patent_number":"US-8468480","title":"Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device","assignee":null,"inventors":[],"filing_date":"2010-03-16T00:00:00.000Z","publication_date":"2013-06-18T00:00:00.000Z","cpc_codes":["G06F","G06F"],"num_claims":13,"abstract":"A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device","description":"A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template ba","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8468480","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8468480","citation_suggestion":"Patentable. \"Method of designing a template pattern, method of manufacturing a template and method of manufacturing a semiconductor device\" (US-8468480). https://patentable.app/patents/US-8468480","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8468480","json":"https://patentable.app/api/llm-context/US-8468480","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T06:57:14.152Z"}