{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8473875","patent":{"patent_number":"US-8473875","title":"Method and system for forming high accuracy patterns using charged particle beam lithography","assignee":null,"inventors":[],"filing_date":"2011-06-25T00:00:00.000Z","publication_date":"2013-06-25T00:00:00.000Z","cpc_codes":["G06F","G06F","G06F"],"num_claims":16,"abstract":"A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged particle beam shots is enhanced by use of partially-overlapping shots. In some embodiments, dosages of the shots may vary with respect to each other before proximity effect correction. Particle beam simulation may be used to calculate the pattern and the edge slope. Enhanced edge slope can improve critical dimension (CD) variation and line-edge roughness (LER) of the pattern produced on the surface."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method and system for forming high accuracy patterns using charged particle beam lithography","description":"A method and system for fracturing or mask data preparation for charged particle beam lithography are disclosed in which accuracy and/or edge slope of a pattern formed on a surface by a set of charged","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8473875","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8473875","citation_suggestion":"Patentable. \"Method and system for forming high accuracy patterns using charged particle beam lithography\" (US-8473875). https://patentable.app/patents/US-8473875","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8473875","json":"https://patentable.app/api/llm-context/US-8473875","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T19:50:42.073Z"}