{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8481245","patent":{"patent_number":"US-8481245","title":"System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules","assignee":null,"inventors":[],"filing_date":"2011-12-21T00:00:00.000Z","publication_date":"2013-07-09T00:00:00.000Z","cpc_codes":["B82Y","G11B","G11B","G11B"],"num_claims":22,"abstract":"A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules","description":"A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8481245","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8481245","citation_suggestion":"Patentable. \"System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules\" (US-8481245). https://patentable.app/patents/US-8481245","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8481245","json":"https://patentable.app/api/llm-context/US-8481245","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T14:58:43.492Z"}