{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8481430","patent":{"patent_number":"US-8481430","title":"Method of manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2011-03-01T00:00:00.000Z","publication_date":"2013-07-09T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":8,"abstract":"The present invention provides a method of manufacturing a semiconductor device. The method includes stacking a SiO2 film, a N-containing stopper film, and a resist pattern in this order on a semiconductor substrate, performing etching on the stopper film and the SiO2 film with a F-containing etching gas, with the resist pattern serving as a mask to form an opening, and performing ashing on the resist pattern to remove the resist pattern, using a gas containing an oxygen gas and an inert gas under the condition that the ratio of the oxygen radical to the inert-gas radical becomes equal to or lower than 5."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of manufacturing semiconductor device","description":"The present invention provides a method of manufacturing a semiconductor device. The method includes stacking a SiO2 film, a N-containing stopper film, and a resist pattern in this order on a semicond","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8481430","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8481430","citation_suggestion":"Patentable. \"Method of manufacturing semiconductor device\" (US-8481430). https://patentable.app/patents/US-8481430","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8481430","json":"https://patentable.app/api/llm-context/US-8481430","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T15:35:07.439Z"}