{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8481472","patent":{"patent_number":"US-8481472","title":"Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition","assignee":null,"inventors":[],"filing_date":"2009-10-06T00:00:00.000Z","publication_date":"2013-07-09T00:00:00.000Z","cpc_codes":["H01L","H01L"],"num_claims":13,"abstract":"A highly aqueous acidic cleaning composition for copper oxide etch removal from Cu-dual damascene microelectronic structures and wherein that composition prevents or substantially eliminates copper redeposition on the Cu-dual damascene microelectronic structure."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition","description":"A highly aqueous acidic cleaning composition for copper oxide etch removal from Cu-dual damascene microelectronic structures and wherein that composition prevents or substantially eliminates copper re","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8481472","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8481472","citation_suggestion":"Patentable. \"Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition\" (US-8481472). https://patentable.app/patents/US-8481472","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8481472","json":"https://patentable.app/api/llm-context/US-8481472","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T23:31:20.269Z"}