{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8482715","patent":{"patent_number":"US-8482715","title":"Monitoring apparatus and method particularly useful in photolithographically processing substrates","assignee":null,"inventors":[],"filing_date":"2010-10-25T00:00:00.000Z","publication_date":"2013-07-09T00:00:00.000Z","cpc_codes":["G01N","H01L","G01N","G01N","G01N"],"num_claims":20,"abstract":"A system for determining at least two properties of a substrate, including a supporting plate configured to support the substrate, and a measurement device coupled to the supporting plate, including an illumination system configured to direct light toward a surface of the substrate, and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the substrate, wherein the measurement device is configured to generate one or more output signals in response to the detected light, and a control unit coupled to the measurement device and configured to determine a first property and a second property of the substrate from the one or more output signals, wherein the first property comprises a presence of macro defects on the substrate, and wherein the second property comprises overlay misregistration in the substrate."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Monitoring apparatus and method particularly useful in photolithographically processing substrates","description":"A system for determining at least two properties of a substrate, including a supporting plate configured to support the substrate, and a measurement device coupled to the supporting plate, including a","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8482715","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8482715","citation_suggestion":"Patentable. \"Monitoring apparatus and method particularly useful in photolithographically processing substrates\" (US-8482715). https://patentable.app/patents/US-8482715","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8482715","json":"https://patentable.app/api/llm-context/US-8482715","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T08:37:26.215Z"}