{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8484586","patent":{"patent_number":"US-8484586","title":"System and method of predicting problematic areas for lithography in a circuit design","assignee":null,"inventors":[],"filing_date":"2012-06-14T00:00:00.000Z","publication_date":"2013-07-09T00:00:00.000Z","cpc_codes":["G06F"],"num_claims":20,"abstract":"A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problematic lithographic areas. The method includes identifying surface heights of plurality of tiles of a modeled wafer, and mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"System and method of predicting problematic areas for lithography in a circuit design","description":"A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problem","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8484586","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8484586","citation_suggestion":"Patentable. \"System and method of predicting problematic areas for lithography in a circuit design\" (US-8484586). https://patentable.app/patents/US-8484586","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8484586","json":"https://patentable.app/api/llm-context/US-8484586","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T06:31:12.480Z"}