{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8488866","patent":{"patent_number":"US-8488866","title":"Method of inspecting mask pattern and mask pattern inspection apparatus","assignee":null,"inventors":[],"filing_date":"2010-02-18T00:00:00.000Z","publication_date":"2013-07-16T00:00:00.000Z","cpc_codes":["G01N","B82Y","B82Y","G01N","G06T","G06T"],"num_claims":16,"abstract":"A inspection image data of the chip A is captured and the data representing the amount of correction of flare corresponded to the chip A is appropriately loaded from the map storage block. Next, a inspection image of the chip A′ is captured, and the data representing the amount of correction of flare corresponded to the chip A′ is loaded from the flare map storage block as the amount of shifting of the edge of the contour of the pattern. The amount of correction is converted, by a correction data generation block which is a correction data generator, into the amount of geometrical correction of pattern which provides correction data. In the comparison block, the images of the geometry of two chips are compared and corrected on the amount of correction of flare generated by a correction data generation block, to thereby judge whether defect is found or not."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of inspecting mask pattern and mask pattern inspection apparatus","description":"A inspection image data of the chip A is captured and the data representing the amount of correction of flare corresponded to the chip A is appropriately loaded from the map storage block. Next, a ins","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8488866","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8488866","citation_suggestion":"Patentable. \"Method of inspecting mask pattern and mask pattern inspection apparatus\" (US-8488866). https://patentable.app/patents/US-8488866","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8488866","json":"https://patentable.app/api/llm-context/US-8488866","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:24:20.619Z"}