{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8490031","patent":{"patent_number":"US-8490031","title":"Method, apparatus and program for adjusting feature dimensions to compensate for planarizing effects in the generation of mask data and manufacturing semiconductor device","assignee":null,"inventors":[],"filing_date":"2010-04-30T00:00:00.000Z","publication_date":"2013-07-16T00:00:00.000Z","cpc_codes":["G06F","G06F","H01L","H01L"],"num_claims":12,"abstract":"A method for manufacturing a semiconductor device includes the steps of reading physical layout data of a circuit to be manufactured and performing calculation to modify a pattern width in the physical layout data by a predetermined amount; reading a physical layout and analyzing a pattern that is predicted to remain as a step difference of a predetermined amount or more in a case where a planarization process is performed on a planarizing film on a pattern by a quantitative calculation by using at least one of a density of patterns, a pattern width, and a peripheral length of a range of interest and a range in the vicinity of the range of interest; and reading data of the pattern that is predicted to remain as a step difference, and making a correction to a layout in which a step difference of a predetermined amount or more does not remain."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method, apparatus and program for adjusting feature dimensions to compensate for planarizing effects in the generation of mask data and manufacturing semiconductor device","description":"A method for manufacturing a semiconductor device includes the steps of reading physical layout data of a circuit to be manufactured and performing calculation to modify a pattern width in the physica","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8490031","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8490031","citation_suggestion":"Patentable. \"Method, apparatus and program for adjusting feature dimensions to compensate for planarizing effects in the generation of mask data and manufacturing semiconductor device\" (US-8490031). https://patentable.app/patents/US-8490031","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8490031","json":"https://patentable.app/api/llm-context/US-8490031","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T12:45:05.886Z"}