{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8497190","patent":{"patent_number":"US-8497190","title":"Process for treating a semiconductor-on-insulator structure","assignee":null,"inventors":[],"filing_date":"2011-12-07T00:00:00.000Z","publication_date":"2013-07-30T00:00:00.000Z","cpc_codes":["H01L"],"num_claims":21,"abstract":"A process for treating a semiconductor-on-insulator structure that has, in succession, a support substrate, a layer of an oxide or oxynitride of a semiconductor material, and a thin semiconductor layer of the semiconductor material. The process includes providing, on the surface of the thin layer, a mask defining exposed regions of the thin layer; providing a layer of nitride or oxynitride of the semiconductor material on the exposed regions of the thin layer; and applying a heat treatment causing at least some of the oxygen in the oxide or oxynitride layer to diffuse through the exposed regions. The nitride or oxynitride layer is provided at a thickness sufficient to provide a ratio of the rate of oxygen diffusion though the exposed regions to that through the regions covered with the mask that is greater than 2."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Process for treating a semiconductor-on-insulator structure","description":"A process for treating a semiconductor-on-insulator structure that has, in succession, a support substrate, a layer of an oxide or oxynitride of a semiconductor material, and a thin semiconductor laye","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8497190","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8497190","citation_suggestion":"Patentable. \"Process for treating a semiconductor-on-insulator structure\" (US-8497190). https://patentable.app/patents/US-8497190","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8497190","json":"https://patentable.app/api/llm-context/US-8497190","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:48:34.597Z"}