{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8501374","patent":{"patent_number":"US-8501374","title":"Method for fracturing and forming a pattern using shaped beam charged particle beam lithography","assignee":null,"inventors":[],"filing_date":"2012-12-21T00:00:00.000Z","publication_date":"2013-08-06T00:00:00.000Z","cpc_codes":["G06F","B82Y","B82Y","G06F"],"num_claims":35,"abstract":"In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which a plurality of shaped beam shots is determined which will form a target pattern on a surface, within a predetermined tolerance, where the plurality of shaped beam shots includes a plurality of circular or nearly-circular character projection (CP) shots plus one or more non-circular shot, and where at least two shots in the plurality of circular or nearly-circular shots overlap. Methods for manufacturing a surface and for manufacturing a semiconductor device on a substrate are also disclosed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method for fracturing and forming a pattern using shaped beam charged particle beam lithography","description":"In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in whi","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8501374","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8501374","citation_suggestion":"Patentable. \"Method for fracturing and forming a pattern using shaped beam charged particle beam lithography\" (US-8501374). https://patentable.app/patents/US-8501374","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8501374","json":"https://patentable.app/api/llm-context/US-8501374","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T18:48:24.335Z"}