{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8501394","patent":{"patent_number":"US-8501394","title":"Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern","assignee":null,"inventors":[],"filing_date":"2009-01-27T00:00:00.000Z","publication_date":"2013-08-06T00:00:00.000Z","cpc_codes":["H01L","H01L","H01L","H01L"],"num_claims":10,"abstract":"There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern","description":"There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity.The method comprises the steps of forming a first convex pattern, o","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8501394","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8501394","citation_suggestion":"Patentable. \"Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern\" (US-8501394). https://patentable.app/patents/US-8501394","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8501394","json":"https://patentable.app/api/llm-context/US-8501394","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T13:14:05.300Z"}