{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8502171","patent":{"patent_number":"US-8502171","title":"Mask manufacturing device","assignee":null,"inventors":[],"filing_date":"2011-12-15T00:00:00.000Z","publication_date":"2013-08-06T00:00:00.000Z","cpc_codes":["B82Y","B82Y","H01L"],"num_claims":5,"abstract":"A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing the pattern is calculated. A heterogeneous layer of which a volume expands more greatly than that of surrounding mask substrate region is formed in a predetermined position within the mask substrate so that volume expansion of the heterogeneous layer according to the positional deviation information is achieved."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Mask manufacturing device","description":"A pattern is formed on a mask substrate. Positional deviation information between an actual position of the pattern formed on the mask substrate and a design position decided at the time of designing ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8502171","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8502171","citation_suggestion":"Patentable. \"Mask manufacturing device\" (US-8502171). https://patentable.app/patents/US-8502171","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8502171","json":"https://patentable.app/api/llm-context/US-8502171","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T12:46:05.207Z"}