{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8510684","patent":{"patent_number":"US-8510684","title":"Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect","assignee":null,"inventors":[],"filing_date":"2011-12-15T00:00:00.000Z","publication_date":"2013-08-13T00:00:00.000Z","cpc_codes":["G06F"],"num_claims":18,"abstract":"A method of forming a layout of a photomask includes receiving a layout of a mask pattern, obtaining image parameters of a two-dimensional (2D) layout mask from a simulation, obtaining image parameters of a three-dimensional (3D) layout mask from a simulation, and obtaining differences between the image parameters of the 2D and 3D masks. The differences between the image parameters of the 2D and 3D masks can be compensated by convolving a probability function with respect to an open area, represented by a visible kernel function, with a mask function to produce a first function, convolving a probability function with respect to a blocked area, represented by a visible kernel function, with the mask function to produce a second function, and summing the first function and the second function to produce a compensated vector. The layout of the mask pattern can be corrected using the compensated vector."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect","description":"A method of forming a layout of a photomask includes receiving a layout of a mask pattern, obtaining image parameters of a two-dimensional (2D) layout mask from a simulation, obtaining image parameter","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8510684","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8510684","citation_suggestion":"Patentable. \"Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect\" (US-8510684). https://patentable.app/patents/US-8510684","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8510684","json":"https://patentable.app/api/llm-context/US-8510684","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-30T20:31:31.254Z"}