{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8519333","patent":{"patent_number":"US-8519333","title":"Charged particle system for reticle/wafer defects inspection and review","assignee":null,"inventors":[],"filing_date":"2012-05-03T00:00:00.000Z","publication_date":"2013-08-27T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N"],"num_claims":22,"abstract":"The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Charged particle system for reticle/wafer defects inspection and review","description":"The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8519333","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8519333","citation_suggestion":"Patentable. \"Charged particle system for reticle/wafer defects inspection and review\" (US-8519333). https://patentable.app/patents/US-8519333","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8519333","json":"https://patentable.app/api/llm-context/US-8519333","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T07:44:29.458Z"}