{"schema_version":"1.0","canonical_url":"https://patentable.app/patents/US-8519446","patent":{"patent_number":"US-8519446","title":"Etch resistant gas sensor","assignee":null,"inventors":[],"filing_date":"2008-12-12T00:00:00.000Z","publication_date":"2013-08-27T00:00:00.000Z","cpc_codes":["G01N","G01N","G01N"],"num_claims":21,"abstract":"A gas sensor for sensing chemical gases utilizes a metal oxynitride as the sensing material, which changes its conductivity when exposed to the analyte gas. The change in conductivity is measured for the sensor output. The metal may be either tungsten or molybdenum."},"analysis":{"summary":null,"layman_explanation":null,"technical_analysis":null,"business_analysis":null,"faqs":null,"topics":[],"tech_cluster":null},"seo":{"title":"Etch resistant gas sensor","description":"A gas sensor for sensing chemical gases utilizes a metal oxynitride as the sensing material, which changes its conductivity when exposed to the analyte gas. The change in conductivity is measured for ","keywords":[]},"attribution":{"source":"Patentable","source_url":"https://patentable.app","canonical_url":"https://patentable.app/patents/US-8519446","license":"CC-BY-4.0-like","license_terms":"AI-generated analysis on this page (summary, layman_explanation, technical_analysis, business_analysis, faqs) may be reused with attribution and a visible link back to the canonical URL above. Patent abstracts, claims, and bibliographic data are USPTO public domain.","required_link":"https://patentable.app/patents/US-8519446","citation_suggestion":"Patentable. \"Etch resistant gas sensor\" (US-8519446). https://patentable.app/patents/US-8519446","copyright_holder":"Nomic Interactive Technology LLC"},"links":{"html":"https://patentable.app/patents/US-8519446","json":"https://patentable.app/api/llm-context/US-8519446","site":"https://patentable.app","llms_txt":"https://patentable.app/llms.txt"},"generated_at":"2026-05-31T21:12:25.175Z"}